High-purity graphite components for wafer processing, crystal growth, epitaxy, and packaging.
Baotan Graphite produces semiconductor-grade graphite tooling with ash content below 5ppm. Our components are used in MOCVD, SiC crystal growth, wafer processing, and advanced packaging — where purity, dimensional stability, and thermal performance are non-negotiable.
Three proprietary coating technologies ensure particle-free operation in the most demanding semiconductor environments.
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Eliminates particle generation in cleanrooms. Ideal for wafer handling and processing where contamination is critical.
High-purity carbon coating achieving 99.99% to 99.9999%. Enhances conductivity, provides uniform non-reactive surface.
Increases surface hardness for wear-prone applications. Extends component life over thousands of cycles.
| Category | Components | Application |
|---|---|---|
| Wafer Processing | Boats, cassettes, susceptors, trays | MOCVD, LPCVD, epitaxy, annealing |
| Crystal Growth | Crucibles, heaters, insulation, supports | SiC crystal growth (PVT), silicon pulling |
| Sintering | Boats, trays, molds | MLCC, rare earth, Li-battery materials |
| Packaging | Encapsulation fixtures, bonding tools | Advanced semiconductor packaging |
| Custom | Any custom-machined component | Per drawing — full OEM customization |
| Parameter | Value |
|---|---|
| Material | Isostatic graphite (IG-110, EK3200 equivalents) |
| Ash Content | ≤ 5 ppm (std) / ≤ 2 ppm (ultra-high purity) |
| Density | 1.78 – 1.85 g/cm³ |
| Grain Size | 5 – 10 µm |
| Coating | SiC (CVD) / Carbon / Nano-hardening / Non-shedding |
| Cleanroom | Class 1000 packaging available |