Componentes de grafito de alta pureza para procesamiento de obleas, crecimiento de cristales, epitaxia y empaquetado.
Baotan Graphite produces semiconductor-grade graphite tooling with ash content below 5ppm. Our components are used in MOCVD, SiC crystal growth, wafer processing, and advanced packaging 鈥?where purity, dimensional stability, and thermal performance are non-negotiable.
Three proprietary coating technologies ensure particle-free operation in the most demanding semiconductor environments.
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Eliminates particle generation in cleanrooms. Ideal for wafer handling and processing where contamination is critical.
High-purity carbon coating achieving 99.99% to 99.9999%. Enhances conductivity, provides uniform non-reactive surface.
Increases surface hardness for wear-prone applications. Extends component life over thousands of cycles.
| Category | Components | Application |
|---|---|---|
| Wafer Processing | Boats, cassettes, susceptors, trays | MOCVD, LPCVD, epitaxy, annealing |
| Crystal Growth | Crucibles, heaters, insulation, supports | SiC crystal growth (PVT), silicon pulling |
| Sintering | Boats, trays, molds | MLCC, rare earth, Li-battery materials |
| Packaging | Encapsulation fixtures, bonding tools | Advanced semiconductor packaging |
| Custom | Any custom-machined component | Per drawing 鈥?full OEM customization |
| Par谩metro | Valor |
|---|---|
| Material | Isostatic graphite (IG-110, EK3200 equivalents) |
| Ash Content | 鈮?5 ppm (std) / 鈮?2 ppm (ultra-high purity) |
| Density | 1.78 鈥?1.85 g/cm鲁 |
| Grain Size | 5 鈥?10 碌m |
| Coating | SiC (CVD) / Carbon / Nano-hardening / Non-shedding |
| Cleanroom | Class 1000 packaging available |
Send specifications. Quote within 24 hours.
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